Novel nanowire fabrication technique paves way for next generation spintronicsAs our world modernizes faster than ever before, there is an ever-growing need for better and faster electronics and computers.Eliminating the etching process by directly fabricating nanowires onto the silicon substrate would lead to a marked improvement in the fabrication of spintronic devices.However, when directly fabricated nanowires are subjected to annealing, they tend to transform into droplets as a result of the internal stresses in the wire.Talking about their research, published in Nanoscale Advances, Prof. Majima says, "our nanostructure-induced ordering method allows the direct fabrication of ultrafine L10-ordered CoPt nanowires with the narrow widths of 30 nm scale required for spintronics.In this study, the researchers first coated a Si/SiO2 substrate with a material called a "resist" and subjected it to electron beam lithography and evaporation to create a stencil for the nanowires."